LASER INTERFERENCE LITHOGRAPHY SYSTEM

WIPO Patent Application WO/2024/031747

A1

A laser interference lithography system, which relates to the technical field of laser interference lithography. The system comprises: a laser device (1), an optical path system, a phase detection apparatus and a substrate (15), wherein the laser device (1) is used for generating a laser light source, and the laser light source is split by the optical path system to form reference light (S3), first measurement light (S1) and second measurement light (S2), which are incident to the phase detection apparatus; the phase detection apparatus is used for obtaining the phase difference between the first measurement light (S1) and the second measurement light (S2) on the basis of the reference light (S3), the first measurement light (S1) and the second measurement light (S2), and feeding back a compensation instruction to the optical path system on the basis of the phase difference; and the optical path system is further used for receiving the compensation instruction, and eliminating the phase difference on the basis of the compensation instruction, so as to obtain two exposure beams with no phase difference, wherein the two exposure beams with no phase difference are used for forming a preset pattern on the substrate (15).

WANG JIE (CN)
LI NA (CN)

PCT/CN2022/114940

February 15, 2024

August 25, 2022

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BEIJING U PREC TECH CO LTD (CN)
BEIJING UNITED VICTORY PRECISION TECH CO LTD (CN)

G03F7/20; G01J9/02

CN110716397A	2020-01-21
CN109870754A	2019-06-11
CN110806680A	2020-02-18
CN110837214A	2020-02-25
CN103092003A	2013-05-08
US5559598A	1996-09-24

YUHONG INTELLECTUAL PROPERTY LAW FIRM (CN)

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