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Title:
LASER PATTERN EXTRACTION METHOD AND APPARATUS, AND LASER MEASUREMENT DEVICE AND SYSTEM
Document Type and Number:
WIPO Patent Application WO/2022/089386
Kind Code:
A1
Abstract:
The embodiments of the present invention relate to the technical field of image processing. Disclosed are a laser pattern extraction method and apparatus, and a laser measurement device and system. The method comprises: acquiring a first laser image containing a laser pattern; identifying the brightness of a current application environment of a laser measurement device according to the first laser image; determining whether the brightness of the current application environment of the laser measurement device matches the first laser image; if the determination result is no, acquiring a second laser image matching the brightness of the current application environment of the laser measurement device; and extracting the laser pattern from the second laser image. By means of the method, the embodiments of the present invention improve the accuracy of laser pattern extraction in various scenes.

Inventors:
WANG WEILIN (CN)
Application Number:
PCT/CN2021/126225
Publication Date:
May 05, 2022
Filing Date:
October 26, 2021
Export Citation:
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Assignee:
AUTEL INTELLIGENT TECH CORP LTD (CN)
International Classes:
G01B11/00; G01B11/25; G01B11/14; G06T5/00; G06T5/40; G06T7/00; H04N5/235
Foreign References:
CN112361990A2021-02-12
CN110475078A2019-11-19
CN108683861A2018-10-19
CN108401457A2018-08-14
CN105222725A2016-01-06
Attorney, Agent or Firm:
AFD CHINA INTELLECTUAL PROPERTY LAW OFFICE (CN)
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