Title:
LAYERED NANOFABRICATION
Document Type and Number:
WIPO Patent Application WO2001058655
Kind Code:
A8
Abstract:
A method for fabricating or prototyping a nanoscale object is disclosed. The method includes defining a sequence of nanolayers that represent the nanoscale object, constructing a current nanolayer (104) on a first surface (108), and depositing a sacrificial layer (112) to cover the first surface but not the nanolayer. The nanolayer represents a slice of the nanoscale object. The nanolayer and the sacrificial layer provide a second surface on which a next nanolayer is constructed. The above construction and deposition steps are repeated if the next nanolayer is not the last nanolayer. The method also includes removing the sacrificial layers to produce the nanoscale object.
Inventors:
REQUICHA ARISTIDES (US)
KOEL BRUCE E (US)
RESCH ROLAND (DE)
LEWIS DIANA (US)
KOEL BRUCE E (US)
RESCH ROLAND (DE)
LEWIS DIANA (US)
Application Number:
PCT/US2001/004326
Publication Date:
January 03, 2002
Filing Date:
February 08, 2001
Export Citation:
Assignee:
UNIV SOUTHERN CALIFORNIA (US)
REQUICHA ARISTIDES (US)
KOEL BRUCE E (US)
RESCH ROLAND (DE)
LEWIS DIANA (US)
REQUICHA ARISTIDES (US)
KOEL BRUCE E (US)
RESCH ROLAND (DE)
LEWIS DIANA (US)
International Classes:
B29C41/00; B29C67/00; B82B3/00; G01Q80/00; G01Q90/00; (IPC1-7): B29C41/02; C04B35/00
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