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Title:
LEARNING DEVICE, INFORMATION PROCESSING DEVICE, SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING SYSTEM, LEARNING METHOD, LEARNING METHOD, AND PROCESSING CONDITION DETERMINATION METHOD
Document Type and Number:
WIPO Patent Application WO/2024/070055
Kind Code:
A1
Abstract:
This learning device comprises: an experiment data acquisition unit that acquires, after processing of a film formed on a substrate is performed by driving a substrate processing device under processing conditions including a variation condition indicating the relative position of a nozzle to the substrate that varies as time elapses, a first processing amount indicating a film thickness difference before and after the processing of the film; a conversion unit that converts the variation condition and a condition among the processing conditions other than the variation condition into processing state data indicating the state of processing in each of a plurality of divided regions obtained by concentrically dividing the upper surface of the substrate; and a predictor generation unit that performs machine learning of learning data comprising the processing state data and the first processing amount corresponding to the processing conditions to generate a learning model for estimating a second processing amount.

Inventors:
TOKUYAMA MASAHIRO (JP)
TAKAGI YOSHINORI (JP)
Application Number:
PCT/JP2023/020528
Publication Date:
April 04, 2024
Filing Date:
June 01, 2023
Export Citation:
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Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/306; G06N20/00; H01L21/02; H01L21/304
Foreign References:
JP2021108367A2021-07-29
JP2020040046A2020-03-19
JP2020038888A2020-03-12
JP2020004817A2020-01-09
JP2018028496A2018-02-22
JP2018065212A2018-04-26
Attorney, Agent or Firm:
NAKAGAWA, Masahiro et al. (JP)
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