Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
LIGHT SOURCE AND EXPOSURE APPARATUS
Document Type and Number:
WIPO Patent Application WO/2015/015749
Kind Code:
A1
Abstract:
According to an example of the present invention, a light source (10) is provided with a light emitting element (11), and a homogenizer (13) that is provided corresponding to the light emitting element (11). Light emitted from the light emitting element (11) is converted into converted light having more uniform intensity distribution by means of the homogenizer (13), and is outputted from the light source (10).

More Like This:
WO/2018/114590PROCESS FOR THE PRODUCTION OF MICROSTRUCTURES
WO/2003/010605PATTERN GENERATION METHOD AND APPARATUS USING CACHED CELLS OF HIERARCHICAL DATA
JP2003114387CATA-DIOPTIC SYSTEM AND PROJECTION EXPOSURE DEVICE EQUIPPED WITH THE SAME SYSTEM
Inventors:
ONUKI TETSUJI (JP)
HIROSE HIDEO (JP)
TAMURA YUICHI (JP)
MARUOKA YUKIO (JP)
HADA KAZUNARI (JP)
Application Number:
PCT/JP2014/003819
Publication Date:
February 05, 2015
Filing Date:
July 18, 2014
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NIKON ENGINEERING CO LTD (JP)
International Classes:
G03F7/20; G02B19/00; H01L21/027
Foreign References:
JP2006313202A2006-11-16
JP2004335952A2004-11-25
JP2007041466A2007-02-15
JP2010263218A2010-11-18
JP2008286971A2008-11-27
JP2010045356A2010-02-25
JP2003215809A2003-07-30
Attorney, Agent or Firm:
FURUYA, Fumio et al. (JP)
Furuya History Wang (JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: NOSE STRUCTURE FOR RAILWAY VEHICLE

Next Patent: INLINE CONCENTRATION METER AND CONCENTRATION DETECTION METHOD