Title:
LIGHTING OPTICAL DEVICE AND PROJECTION ALIGNER
Document Type and Number:
WIPO Patent Application WO/2005/041277
Kind Code:
A1
Abstract:
A lighting optical device and a projection aligner capable of reducing a light quantity loss when a mask is illuminated with a polarized lighting light. A lighting optical system (ILS) for illuminating a reticle (R) with a lighting light (IL) and a projection optical system (PL) for projecting the pattern image of the reticle (R) onto a wafer (W) are provided. A lighting light (IL) emitted from an exposure light source (1) in a linearly polarized state in the lighting optical system (ILS) passes through first and second double-refraction members (12, 13) having different advanced-phase-axis directions and is converted into a polarized state that is substantially linearly polarized in a circumferential direction with the optical axis as the center in an almost specific annular area, and then illuminates the reticle (R) under an annular illuminating condition after passing through a fly-eye lens (14).
Inventors:
SHIRAISHI NAOMASA (JP)
Application Number:
PCT/JP2004/015853
Publication Date:
May 06, 2005
Filing Date:
October 26, 2004
Export Citation:
Assignee:
NIKON CORP (JP)
SHIRAISHI NAOMASA (JP)
SHIRAISHI NAOMASA (JP)
International Classes:
G02B19/00; G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G02B19/00; G03F7/20
Domestic Patent References:
| WO2000002092A1 | 2000-01-13 | |||
| WO2000067303A1 | 2000-11-09 |
Foreign References:
| JPH09184918A | 1997-07-15 | |||
| JP2003035822A | 2003-02-07 | |||
| JPH05283317A | 1993-10-29 | |||
| JP2001274083A | 2001-10-05 | |||
| JP2000114157A | 2000-04-21 | |||
| JPH07183201A | 1995-07-21 | |||
| JPS6191662A | 1986-05-09 | |||
| JPH04101148A | 1992-04-02 | |||
| US6233041B1 | 2001-05-15 | |||
| JPH04225357A | 1992-08-14 | |||
| US6211944B1 | 2001-04-03 | |||
| JPH05109601A | 1993-04-30 | |||
| US20010019404A1 | 2001-09-06 | |||
| US6252712B1 | 2001-06-26 | |||
| US5739898A | 1998-04-14 |
Other References:
See also references of EP 1681710A4
THIMOTHY A. BRUNNER ET AL.: "High NA Lithographic imaging at Brewster's angle", SPIE (USA, vol. 4691, 2002, pages 1 - 24
THIMOTHY A. BRUNNER ET AL.: "High NA Lithographic imaging at Brewster's angle", SPIE (USA, vol. 4691, 2002, pages 1 - 24
Attorney, Agent or Firm:
Omori, Satoshi (2075-2-501 Noborito, Tama-k, Kawasaki-shi Kanagawa 14, JP)
Download PDF:
Previous Patent: METHOD FOR REDUCING PARASITIC COUPLINGS IN CIRCUITS
Next Patent: CRYSTAL GROWING UNIT
Next Patent: CRYSTAL GROWING UNIT