Title:
LIQUID COMPOSITION FOR FERROELECTRIC THIN FILM FORMATION AND PROCESS FOR PRODUCING FERROELECTRIC THIN FILM
Document Type and Number:
WIPO Patent Application WO/2005/010895
Kind Code:
A1
Abstract:
A liquid composition for thin film formation from which a ferroelectric thin film of excellent properties can be produced even through sintering at low temperature and a process for producing a ferroelectric thin film from the liquid composition. In particular, use is made of a liquid composition for ferroelectric thin film formation characterized in that crystalline ferroelectric oxide particles of 100 nm or less average primary particle diameter represented by the general formula (Bi2O2)2+(Bim-1TimO3.5m-0.5)2- [m is an integer of 1 to 5] or the general formula (Bi2O2)2+(Am-1TimO3.5m-0.5)2- [A represents Bi3+ and La3+ provided that the ratio of La3+/Bi3+ is in the range of 0.05 to 0.5, and m is an integer of 1 to 5] are dispersed in a liquid medium and that a soluble metal compound capable of forming a ferroelectric oxide when heated is dissolved therein.
Inventors:
SUNAHARA KAZUO (JP)
TOMONAGA HIROYUKI (JP)
BEPPU YOSHIHISA (JP)
TOMONAGA HIROYUKI (JP)
BEPPU YOSHIHISA (JP)
Application Number:
PCT/JP2004/010636
Publication Date:
February 03, 2005
Filing Date:
July 26, 2004
Export Citation:
Assignee:
ASAHI GLASS CO LTD (JP)
SUNAHARA KAZUO (JP)
TOMONAGA HIROYUKI (JP)
BEPPU YOSHIHISA (JP)
SUNAHARA KAZUO (JP)
TOMONAGA HIROYUKI (JP)
BEPPU YOSHIHISA (JP)
International Classes:
C01G23/00; C01G29/00; H01B1/22; H01L21/316; H01L41/317; H01L41/39; H01L41/43; (IPC1-7): H01B3/12; H01L21/316; C01G29/00
Foreign References:
| JP2001144263A | 2001-05-25 | |||
| JP2000332209A | 2000-11-30 | |||
| JPH06119811A | 1994-04-28 | |||
| JP2003124444A | 2003-04-25 | |||
| JPH0986906A | 1997-03-31 | |||
| JP2001240469A | 2001-09-04 |
Other References:
See also references of EP 1650769A4
Attorney, Agent or Firm:
Senmyo, Kenji (38 Kanda-Higashimatsushitach, Chiyoda-ku Tokyo, JP)
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