Title:
LIQUID CRYSTAL COMPOSITION, METHOD FOR PRODUCING SAME, AND FILM
Document Type and Number:
WIPO Patent Application WO/2014/050426
Kind Code:
A1
Abstract:
The present invention provides a method for producing a liquid crystal composition in a single step, said liquid crystal composition using two or more different types of carboxylic acid as a type of raw material, and having the ability to inhibit crystallization, and having high solubility and liquid crystallinity. The method for producing the liquid crystal composition involves reacting a compound represented by formula (III) with a carboxylic acid represented by formula (IV) and a carboxylic acid represented by formula (V) so as to simultaneously obtain a liquid crystal compound represented by formula (I) and a liquid crystal compound represented by formula (II). (P1 is a polymerizable group; Sp1 is a divalent aliphatic group or the like having three to twelve carbons; T1 is a 1,4-phenylene group; T2 is a divalent group having a single bond and cyclic structure; A1 is -COO- or the like; A2 and A3 are -OCO- or the like; B is a divalent group having a cyclic structure; X is a hydrogen atom, an alkyl group with one to twelve carbons, or the like; Y1 and Y2 are O, NR1, or S; and R1 is a hydrogen atom, or a methyl group.) Formula (I): P1-Sp1-T1-A1-B-A2-T1-Sp1-P1; formula (II): P1-Sp1-T1-A1-B-A3-T2-X; formula (III): HY1-B-Y2H; formula (IV): P1-Sp1-T1-COOH; formula (V): X-T2-COOH
Inventors:
KATOH SHUNYA (JP)
MATSUYAMA HIROSHI (JP)
YOSHIKAWA MASARU (JP)
MATSUYAMA HIROSHI (JP)
YOSHIKAWA MASARU (JP)
Application Number:
PCT/JP2013/073284
Publication Date:
April 03, 2014
Filing Date:
August 30, 2013
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
C09K19/46; C07C67/03; C07C69/92; C07C231/12; C07C233/81; C07C269/06; C07C271/28; C07C271/48; C08F20/30; C08F220/30; G02B5/26; G02F1/13; G02F1/13363
Domestic Patent References:
| WO2013035733A1 | 2013-03-14 | |||
| WO1998047979A1 | 1998-10-29 | |||
| WO1996004351A1 | 1996-02-15 | |||
| WO1997000600A2 | 1997-01-09 | |||
| WO2003006570A2 | 2003-01-23 |
Foreign References:
| JP2011213614A | 2011-10-27 | |||
| JP2005206579A | 2005-08-04 | |||
| JP2001019661A | 2001-01-23 | |||
| US4370366A | 1983-01-25 |
Attorney, Agent or Firm:
SIKs & Co. (JP)
Patent business corporation patent firm Sykes (JP)
Patent business corporation patent firm Sykes (JP)
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