Title:
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO2005071486
Kind Code:
A3
Abstract:
In a lithographic apparatus a beam of radiation passes along a beam path to a substrate, for applying patterned illumination to the substrate. An exhangeable aperture screen (22A) is inserted in the beam path to partially block out the beam from a remainder of the path onto the substrate. A test surface (28) is provided on the aperture screen, so that the test surface receives a part of the beam that is not passed along the remainder of the beam path. The test surface is made of a material that is sensitive, under influence of radiation from the beam, to chemical alterations that also affect the optical element (24) under influence of radiation from the beam. The test surface is later analyzed for chemical alterations after exposure to the beam.
Inventors:
MOORS JOHANNES HUBERTUS JOSEPH (NL)
MICKAN UWE (NL)
MICKAN UWE (NL)
Application Number:
PCT/NL2005/000042
Publication Date:
September 09, 2005
Filing Date:
January 21, 2005
Export Citation:
Assignee:
ASML NETHERLANDS BV (NL)
MOORS JOHANNES HUBERTUS JOSEPH (NL)
MICKAN UWE (NL)
MOORS JOHANNES HUBERTUS JOSEPH (NL)
MICKAN UWE (NL)
International Classes:
G03F7/20; (IPC1-7): G03F7/20
Foreign References:
| US6377651B1 | 2002-04-23 | |||
| US20030053594A1 | 2003-03-20 | |||
| EP0444937A2 | 1991-09-04 |
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