Title:
LITHOGRAPHY SYSTEM AND METHOD FOR DEVICE MANUFACTURE
Document Type and Number:
WIPO Patent Application WO2002093254
Kind Code:
A8
Abstract:
A lithography system and method for cost-effective device manufacture that can employ a new "flash-on-the-fly" mode of operation is disclosed, wherein exposure fields are formed with single pulses of radiation. The system includes a pulsed radiation source (14), an illumination system (24), a mask (M), a projection lens (40) an a workpiece stage (50) that supports a workpiece (W) having an image-bearing surface (WS). A radiation source controller (16) and a workpiece stage position system (60), which includes a metrology device (62), are used to coordinate and control the exposure of the mask with radiation pulses so that adjacent radiation pulses form adjacent exposure fields (EF). Where pulse-to-pulse uniformity from the radiation source is lacking, a pulse stabilization system (18) may be optionally used to attain the desired pulse-to-pulse uniformity in exposure dose. The rapidity at which exposures can be made using a single radiation pulse allows for a very high throughput, which in turn allows for a small-image- field projection lens to be utilized in a cost-effective manner in the manufacture of devices such as semiconductor integrated circuits and the like. The system can also be used in the conventional "step-and-repeat" mode of operation, so that the system owner can decide the most cost-effective mode of operation for any given application.
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Inventors:
MEISBURGER DAN
MARKLE DAVID A
MARKLE DAVID A
Application Number:
PCT/US2002/009593
Publication Date:
December 27, 2002
Filing Date:
March 27, 2002
Export Citation:
Assignee:
ULTRATECH STEPPER INC (US)
International Classes:
G03F7/22; G03F7/20; H01L21/027; (IPC1-7): G03B27/72
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