Title:
LOADLOCK BATCH OZONE CURE
Document Type and Number:
WIPO Patent Application WO/2011/159905
Kind Code:
A3
Abstract:
A substrate processing chamber for processing a plurality of wafers in batch mode. In one embodiment the chamber includes a vertically aligned housing having first and second processing areas separated by an internal divider, the first processing area positioned directly over the second processing area; a multi-zone heater operatively coupled to the housing to heat the first and second processing areas independent of each other; a wafer transport adapted to hold a plurality of wafers within the processing chamber and move vertically between the first and second processing areas; a gas distribution system adapted to introduce ozone into the second area and steam into the first processing area; and a gas exhaust system configured to exhaust gases introduced into the first and second processing areas.
Inventors:
LUBOMIRSKY DMITRY (US)
PINSON II JAY D (US)
FLOYD KIRBY H (US)
KHAN ADIB (US)
VENKATARAMAN SHANKAR (US)
PINSON II JAY D (US)
FLOYD KIRBY H (US)
KHAN ADIB (US)
VENKATARAMAN SHANKAR (US)
Application Number:
PCT/US2011/040713
Publication Date:
April 19, 2012
Filing Date:
June 16, 2011
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
LUBOMIRSKY DMITRY (US)
PINSON II JAY D (US)
FLOYD KIRBY H (US)
KHAN ADIB (US)
VENKATARAMAN SHANKAR (US)
LUBOMIRSKY DMITRY (US)
PINSON II JAY D (US)
FLOYD KIRBY H (US)
KHAN ADIB (US)
VENKATARAMAN SHANKAR (US)
International Classes:
H01L21/677; H01L21/02
Foreign References:
| JP2003209152A | 2003-07-25 | |||
| JP2010123752A | 2010-06-03 | |||
| JP2010520649A | 2010-06-10 | |||
| JP2003100621A | 2003-04-04 | |||
| JP2006228974A | 2006-08-31 |
Attorney, Agent or Firm:
SHAFFER, William L. et al. (Two Embarcadero Center 8th Floo, San Francisco California, US)
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