Title:
LOW-FREQUENCY STIMULATION MASK
Document Type and Number:
WIPO Patent Application WO/2020/130454
Kind Code:
A1
Abstract:
The present invention provides a low-frequency stimulation mask comprising: a mask body making close contact with a facial portion while encompassing same, and having open eye-exposure portions; and a low-frequency stimulation member provided on the inner surface of the mask body, wherein the mask body includes a plurality of vertically divided surfaces, which comprises a first surface (110) of a central portion thereof, and a second surface (120) and a third surface (130) that are rotatably provided on both the left and right sides of the first surface, the low-frequency stimulation member includes: a support portion (20) formed to protrude from the inner surface of the mask body; a body portion (30) of which one end is coupled to the support portion and is movably coupled toward the mask body along the support portion; and a low-frequency stimulation electrode (40) which is made of a conductive material and which is coupled to the other end of the body portion.
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Inventors:
SURH CHEE EUN (KR)
Application Number:
PCT/KR2019/017345
Publication Date:
June 25, 2020
Filing Date:
December 10, 2019
Export Citation:
Assignee:
PSYCHE INC (KR)
International Classes:
A61N1/32; A45D44/22; A61N1/04; A61N1/36
Foreign References:
| KR20130033569A | 2013-04-04 | |||
| KR101720879B1 | 2017-03-29 | |||
| KR101814075B1 | 2018-01-02 | |||
| KR200320315Y1 | 2003-07-16 | |||
| KR101497617B1 | 2015-03-03 |
Attorney, Agent or Firm:
MI PATENT AND LAW FIRM (KR)
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