Title:
LOW-PERMITTIVITY DIELECTRIC COMPOSITION FOR DISPLAY DIELECTRIC FILM, METHOD FOR MANUFACTURING LOW-PERMITTIVITY DIELECTRIC FILM FOR DISPLAY AND DISPLAY DEVICE USING SAME
Document Type and Number:
WIPO Patent Application WO/2021/162358
Kind Code:
A1
Abstract:
The present invention relates to a dielectric composition comprising an acrylate-based monomer and a silane compound represented by formula 1, wherein the silane compound is contained in the amount of 1 wt% to 10 wt% with respect to the acrylate-based monomer. A dielectric film formed by irradiating the dielectric composition with UV comprises a low-permittivity dielectric composition for a display dielectric film having the permittivity of 2 to 2.7.
Inventors:
SUNG MYUNG-MO (KR)
KIM HONG-BUM (KR)
YUN HONG-RO (KR)
KIM HONG-BUM (KR)
YUN HONG-RO (KR)
Application Number:
PCT/KR2021/001551
Publication Date:
August 19, 2021
Filing Date:
February 05, 2021
Export Citation:
Assignee:
IUCF HYU (KR)
International Classes:
C08F220/18; C08F230/08; G06F3/041; H01B3/44; H01B3/46; H01L27/32; H01L51/52
Foreign References:
| KR20160045198A | 2016-04-27 | |||
| US20060210929A1 | 2006-09-21 | |||
| KR20080079986A | 2008-09-02 | |||
| KR20060100980A | 2006-09-22 | |||
| KR20190094734A | 2019-08-14 |
Attorney, Agent or Firm:
CHOI, Hoon-Sik (KR)
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