LOW-POLYDISPERSITY PHOTOIMAGEABLE POLYMERS AND PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY

Title:

LOW-POLYDISPERSITY PHOTOIMAGEABLE POLYMERS AND PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY

Document Type and Number:

WIPO Patent Application WO2005031462

Kind Code:

B1

Abstract:

The invention pertains to low polydispersity copolymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity copolymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.

Inventors:

FEIRING ANDREW EDWARD (US)
FRYD MICHAEL (US)
SCHADT FRANK L III (US)

Application Number:

PCT/US2004/031247

Publication Date:

June 02, 2005

Filing Date:

September 22, 2004

Export Citation:

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Assignee:

DU PONT (US)
FEIRING ANDREW EDWARD (US)
FRYD MICHAEL (US)
SCHADT FRANK L III (US)

International Classes:

C08F2/32; C08F10/00; C08F220/10; C08F220/22; C08F220/26; C08F232/00; C09D133/14; G03C1/492; G03F7/004; G03F7/038; G03F7/039; (IPC1-7): G03F7/004; C08F2/32; C08F220/10; C08F220/22; C08F232/00

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