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Patent Searching and Data


Title:
LOW-REFRACTIVE-INDEX ALL-DIELECTRIC FLAT LENS MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/196077
Kind Code:
A1
Abstract:
A low-refractive-index all-dielectric flat lens manufacturing method, comprising the following steps: selecting a dielectric substrate material and a lens structure material; determining the incident wavelength λ; calculating a phase modulation corresponding to each columnar structure unit; periodically sampling a circular region with a radius R on the dielectric substrate to obtain a plurality of sampling points; calculating the phase modulation required at the position r of each sampling point; obtaining a columnar structure corresponding to each of the sampling points; and arranging different low-refractive-index columnar dielectric structures having the same thickness on the dielectric substrate, so as to obtain the low-refractive-index all-dielectric flat lens.

Inventors:
DONG JIANWEN (CN)
FAN ZHIBIN (CN)
CHEN YUJIE (CN)
SHAO ZENGKAI (CN)
YU SIYUAN (CN)
Application Number:
PCT/CN2018/082920
Publication Date:
October 17, 2019
Filing Date:
April 13, 2018
Export Citation:
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Assignee:
UNIV SUN YAT SEN (CN)
International Classes:
G02B3/00
Domestic Patent References:
WO2011100070A12011-08-18
Foreign References:
CN105487145A2016-04-13
CN106094066A2016-11-09
CN101604034A2009-12-16
CN107315206A2017-11-03
Attorney, Agent or Firm:
YOGO PATENT AND TRADEMARK AGENCY LIMITED COMPANY (CN)
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