MAGNETIC FIELD GENERATOR FOR MAGNETRON SPUTTERING

WIPO Patent Application WO/2016/148058

A1

This magnetic field generator for magnetron sputtering is shaped like a racetrack, is for generating a magnetic field on the surface of a target, and is characterized by comprising, on a base formed of a magnetic body: (a) a central-section permanent magnet (magnetized in the vertical direction) arranged linearly; (b) outer circumferential-section permanent magnets (magnetized in the vertical direction) arranged so as to surround the central-section permanent magnet; (c) first intermediate-section permanent magnets (magnetized in the vertical direction), second intermediate-section permanent magnets (magnetized in the horizontal direction), and third intermediate-section permanent magnets (magnetized in the vertical direction), which are arranged on both sides of the central-section permanent magnet; and (d) fourth intermediate-section permanent magnet (magnetized in the vertical direction) arranged apart from both ends of the central-section permanent magnet in the long-side direction thereof, wherein the second intermediate-section permanent magnets are each arranged such that one of the magnetic poles faces the target-side lateral surface of each of the first intermediate-section permanent magnets.

KURIYAMA YOSHIHIKO (JP)

PCT/JP2016/057752

September 22, 2016

March 11, 2016

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HITACHI METALS LTD (JP)

C23C14/35

JP2004083974A	2004-03-18
JP2014210967A	2014-11-13
JPH03257162A	1991-11-15
JPH0463273A	1992-02-28
JP2015147955A	2015-08-20

TAKAISHI Kitsuma (JP)
Kitsuma Takaishi (JP)

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