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Title:
MAGNETIC THIN FILM PRODUCTION METHOD AND APPARATUS, AND MAGNETIC THIN FILM
Document Type and Number:
WIPO Patent Application WO/2002/033715
Kind Code:
A1
Abstract:
A method for producing a magnetic thin film by which an iron carbide or iron carbide-cobalt film the main phase of which is an a'-phase is formed stably without being influenced by the temperature of the deposit surface where the thin film is to be formed, an apparatus for producing a magnetic film wherein a desired plasma condition of the surface of a substrate where an iron carbide or iron carbide-cobalt film the main phase of which is an a'-phase is deposited can be set, and a magnetic thin film having a high saturation magnetization, a low coercive force, and a high temperature resistance are disclosed. The method is characterized by comprising step A of producing a plasma little damaging the deposits urface of the substrate over the substrate placed in a reduced-pressure space by using a process gas and forming an iron carbideo r iron carbide-cobalt film the main phase of which is an a'-phase and composed of constituent elements including at least carbona nd iron or carbon, iron, and cobalt on the substrate by using the plasma and a material source of the magnetic film. The magnetic thin film formed by the production method and apparatus is preferably used to produce a magnetic pole material of a magnetic head for recording a magnetism signal on a medium such as a hard disk, a floppy disk, or a magnetic tape.

Inventors:
TAKAHASHI MIGAKU (JP)
DJAYAPRAWIRA DAVID (JP)
SHOJI HIROKI (JP)
Application Number:
PCT/JP2001/009187
Publication Date:
April 25, 2002
Filing Date:
October 19, 2001
Export Citation:
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Assignee:
TAKAHASHI MIGAKU (JP)
DJAYAPRAWIRA DAVID (JP)
SHOJI HIROKI (JP)
International Classes:
C23C14/06; C23C14/35; H01F10/16; H01F10/18; H01F41/18; (IPC1-7): H01F41/18; C23C14/06
Foreign References:
JPH01264919A1989-10-23
JPH02137712A1990-05-28
JPH08255712A1996-10-01
JPH08147678A1996-06-07
JPS60212821A1985-10-25
JPH0322404A1991-01-30
Attorney, Agent or Firm:
Yamaguchi, Iwao c/o YAMAGUCHI International Patent Office 3-2 (Higashigotanda 2-chome Shinagawa-ku, Tokyo, JP)
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