Title:
MAGNETOSTATIC WAVE DEVICE AND METHOD FOR MANUFACTURING THE SAME
Document Type and Number:
WIPO Patent Application WO/1998/052202
Kind Code:
A1
Abstract:
At the time of patterning a magnetic garnet film formed on the surface of a nonmagnetic garnet substrate, a magnetic garnet film, an intermediate layer, and a resist layer are successively formed on the surface of the substrate in this order from the substrate side, and the garnet film, the intermediate layer, and the resist layer are etched with a hot phosphoric acid solution after the intermediate and the resist layers are shaped in an island-like form. When the intermediate layer is constituted of a material which is more soluble in the hot phosphoric acid solution than the resist layer, the side faces of the magnetic garnet film become gentle slopes after etching and a conductive pattern can be formed continuously over the surfaces of the nonmagnetic garnet substrate and magnetic garnet film. When a protective layer is formed on the rear surface of the substrate, in addition, the angle of a magnetic field applied to the surface of the magnetic garnet film can be controlled accurately.
Inventors:
KURATA HITOYOSHI (JP)
Application Number:
PCT/JP1998/001176
Publication Date:
November 19, 1998
Filing Date:
March 19, 1998
Export Citation:
Assignee:
TDK CORP (JP)
KURATA HITOYOSHI (JP)
KURATA HITOYOSHI (JP)
International Classes:
H01F10/24; H03H2/00; (IPC1-7): H01F10/24; H03B5/18
Foreign References:
| JPS4974398A | 1974-07-18 | |||
| JPH06333771A | 1994-12-02 |
Attorney, Agent or Firm:
Ishii, Yoichi (23-1 Yushima 3-chom, Bunkyo-ku Tokyo, JP)
Download PDF:
Previous Patent: HIGH STRENGTH, DUCTILE, Co-Fe-C SOFT MAGNETIC ALLOY
Next Patent: COMBINATION OF AC REACTOR AND FUSE
Next Patent: COMBINATION OF AC REACTOR AND FUSE