Title:
MAINTENANCE METHOD, EXPOSURE METHOD AND EXPOSURE DEVICE, AND METHOD FOR FABRICATING DEVICE
Document Type and Number:
WIPO Patent Application WO/2008/075742
Kind Code:
A1
Abstract:
An exposure device includes a member having a liquid repellent surface for a first liquid, and exposes a substrate with exposure light through the first liquid. A maintenance method of the exposure device recovers deteriorated liquid repellency by removing a portion of the surface of the above-mentioned member. Surface energy of the member can be reduced by removing the surface layer where surface energy has increased and exposing the underlying layer where surface energy has not increased, and thereby the liquid repellency can be recovered.
Inventors:
NAGASAKA HIROYUKI (JP)
Application Number:
PCT/JP2007/074557
Publication Date:
June 26, 2008
Filing Date:
December 20, 2007
Export Citation:
Assignee:
NIKON CORP (JP)
NAGASAKA HIROYUKI (JP)
NAGASAKA HIROYUKI (JP)
International Classes:
H01L21/027; G03F7/20
Foreign References:
| JP2006165502A | 2006-06-22 | |||
| JP2004207711A | 2004-07-22 | |||
| JP2002267799A | 2002-09-18 |
Attorney, Agent or Firm:
SHIGA, Masatake et al. (Marunouchi Chiyoda-k, Tokyo 20, JP)
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