Title:
MANUFACTURING METHOD OF GRAPHENE MEMBRANE PELLICLE FOR EXTREME ULTRA VIOLET LITHOGRAPHIC APPARATUS
Document Type and Number:
WIPO Patent Application WO/2024/076221
Kind Code:
A1
Abstract:
The present invention pertains to a manufacturing method of a graphene membrane pellicle for an extreme ultra violet (EUV) lithographic apparatus. The present invention provides a manufacturing method of a graphene membrane pellicle for an EUV lithographic apparatus, whereby a pellicle for protecting photomasks in an EUV lithographic apparatus using a graphene-deposited catalytic metal film can be produced. A graphene membrane pellicle produced by this graphene membrane pellicle manufacturing method uses layered graphene and thus has the advantage of being adjustable in thickness.
Inventors:
KIM YONG KI (KR)
Application Number:
PCT/KR2023/015492
Publication Date:
April 11, 2024
Filing Date:
October 10, 2023
Export Citation:
Assignee:
CHARMGRAPHENE CO LTD (KR)
International Classes:
G03F1/62; G03F1/22
Foreign References:
| JP2015018228A | 2015-01-29 | |||
| KR20200063945A | 2020-06-05 | |||
| KR20180134104A | 2018-12-18 | |||
| KR20140100326A | 2014-08-14 | |||
| JP2018531865A | 2018-11-01 |
Other References:
KRAJEWSKA ALEKSANDRA; PASTERNAK IWONA; SOBON GRZEGORZ; SOTOR JAROSLAW; PRZEWLOKA ALEKSANDRA; CIUK TYMOTEUSZ; SOBIESKI JAN; GRZONKA: "Fabrication and applications of multi-layer graphene stack on transparent polymer", APPLIED PHYSICS LETTERS, AMERICAN INSTITUTE OF PHYSICS, 2 HUNTINGTON QUADRANGLE, MELVILLE, NY 11747, vol. 110, no. 4, 23 January 2017 (2017-01-23), 2 Huntington Quadrangle, Melville, NY 11747, XP012215526, ISSN: 0003-6951, DOI: 10.1063/1.4974457
Attorney, Agent or Firm:
KIM, Jae Sub (KR)
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