Title:
MANUFACTURING METHOD OF MASK, AND MASK
Document Type and Number:
WIPO Patent Application WO/2020/143201
Kind Code:
A1
Abstract:
A manufacturing method of a mask, and a mask. The manufacturing method of a mask comprises: forming a first patterned photoresist layer; forming photoresist patterns (20, 30); forming an electroformed layer (40); and forming a mask. The mask is manufactured by the above manufacturing method. The manufacturing method of a mask and the mask can reduce an angle of an opening of the electroformed layer (40), increase a light-emitting area, enhance thickness uniformity of the electroformed layer (40), and allow the thickness of the electroformed layer (40) to be adjusted.
Inventors:
LIU ZHOUYING (CN)
Application Number:
PCT/CN2019/095716
Publication Date:
July 16, 2020
Filing Date:
July 12, 2019
Export Citation:
Assignee:
KUNSHAN GOVISIONOX OPTOELECTRONICS CO LTD (CN)
International Classes:
H01L27/32; G03F1/62
Foreign References:
| CN109830511A | 2019-05-31 | |||
| CN108374147A | 2018-08-07 | |||
| CN105543905A | 2016-05-04 | |||
| CN108628091A | 2018-10-09 | |||
| CN108179378A | 2018-06-19 | |||
| US20170069843A1 | 2017-03-09 |
Attorney, Agent or Firm:
BEIJING EAST IP LTD. (CN)
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