Title:
MANUFACTURING METHOD AND OPTICAL DEFLECTOR
Document Type and Number:
WIPO Patent Application WO/2020/255627
Kind Code:
A1
Abstract:
Provided is a method of manufacturing an optical deflector, in which a piezoelectric film layer having a uniform film thickness is formed on a substrate layer in spite of etching of the substrate layer and abnormal vibration of a movable support part can be suppressed. A cavity 43 that is open to an SiO2 layer 35 side by etching an SOI wafer 30 from the SiO2 layer 35 side is formed in a formation region of an external piezoelectric actuator 15a, and an exposure surface of the cavity 43 is covered with an SiO2 layer 45. Next, the SiO2 layer 35 of the SOI wafer 30 and a support layer 52 of an SOI wafer 50 are joined to each other to manufacture an SOI wafer 56 in which the cavity 43 is enclosed. Next, after a recess part 63 is formed on the rear surface side of the SOI wafer 56, anisotropic dry etching is performed from the rear surface side in the depth direction of the recess part 63 to remove the SiO2 layer 45.
Inventors:
CHIBA HIROFUMI (JP)
Application Number:
PCT/JP2020/020384
Publication Date:
December 24, 2020
Filing Date:
May 22, 2020
Export Citation:
Assignee:
STANLEY ELECTRIC CO LTD (JP)
International Classes:
G02B26/08; B81B3/00; B81C1/00; G02B26/10
Domestic Patent References:
| WO2010122751A1 | 2010-10-28 |
Foreign References:
| JP2017211576A | 2017-11-30 | |||
| JP2015219516A | 2015-12-07 | |||
| US20180180871A1 | 2018-06-28 | |||
| CN104765144A | 2015-07-08 | |||
| JP2017211576A | 2017-11-30 | |||
| JP2017074625A | 2017-04-20 |
Other References:
See also references of EP 3985426A4
Attorney, Agent or Firm:
SATO & ASSOCIATES (JP)
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