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Patent Searching and Data


Title:
MANUFACTURING METHOD FOR SUBSTRATE WITH METAL PATTERN
Document Type and Number:
WIPO Patent Application WO/2019/131290
Kind Code:
A1
Abstract:
Provided is a manufacturing method for a substrate with a metal pattern, by which damage to a fluororesin layer is suppressed and a metal pattern can be formed on the surface of the fluororesin layer with good patterning characteristics. Specifically provided is a manufacturing method for a substrate with a metal pattern comprising a substrate 1, a fluororesin layer 3, and a metal pattern 5, wherein a composition including a fluororesin having an amide group and a solvent is applied to the substrate 1 and is dried to form the fluororesin layer 3; a pattern formation area set in a portion of the surface of the fluororesin layer 3 is irradiated with an actinic ray; and a metal-particle-dispersed liquid, in which metal particles are dispersed in a dispersion solvent, is applied to the surface of the fluororesin layer 3, and is dried.

Inventors:
NAKAYAMA FUMIKO (JP)
Application Number:
PCT/JP2018/046414
Publication Date:
July 04, 2019
Filing Date:
December 17, 2018
Export Citation:
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Assignee:
AGC INC (JP)
International Classes:
H05K3/10; B05D1/36; B05D3/06; B05D7/24; H01B13/00; H05K3/38; H01B1/22; H01B5/14
Domestic Patent References:
WO2006129800A12006-12-07
WO2016136817A12016-09-01
Attorney, Agent or Firm:
SENMYO Kenji et al. (JP)
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