MASK ADHESIVE AND PELLICLE COMPRISING SAME

Title:

MASK ADHESIVE AND PELLICLE COMPRISING SAME

Document Type and Number:

WIPO Patent Application WO/2019/189310

Kind Code:

A1

Abstract:

The present invention addresses the problem of providing a mask adhesive that plastically deforms easily in the temperature region in which exposure is performed, the mask adhesive being configured so that almost no adhesive residue remains after peeling from the mask, ease of handling is excellent, and haze on a pellicle film is unlikely to be increased. A mask adhesive resolving this problem contains 100 parts by mass of a thermoplastic elastomer (A) for which the temperature at which the loss tangent measured at a frequency of 1Hz is at a maximum value is -20 to 30°C, 20-150 parts by mass of a tackifier resin (B), and 20-150 parts by mass of a process oil (C). The total of the proportion (%CP) of paraffin carbon and the proportion (%CN) of naphthene carbon in the process oil (C) is 50% or more. The temperature of the mask adhesive at which the loss tangent measured at a frequency of 1Hz is at a maximum value is -10 to 30°C, and the sulfur content of the mask adhesive is 300 μg/g or less.

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Inventors:

BIYAJIMA TSUNEAKI
TANEICHI DAIKI

Application Number:

PCT/JP2019/013094

Publication Date:

October 03, 2019

Filing Date:

March 27, 2019

Export Citation:

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Assignee:

MITSUI CHEMICALS INC (JP)

International Classes:

G03F1/62; C09J11/06; C09J123/02; C09J125/04; C09J133/04; C09J153/02

Domestic Patent References:

WO2012004951A1

2012-01-12

Foreign References:

JP2014211591A	2014-11-13
JP2016173414A	2016-09-29