Title:
MASK ATTITUDE MONITORING METHOD AND APPARATUS AND MASK PARTICLE SIZE MEASUREMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/135557
Kind Code:
A1
Abstract:
A mask attitude monitoring method and apparatus and a mask particle size measurement device. The monitoring method comprises: obtaining a distance (H1, H2) from at least one calibration point to a standard surface (A) along a first direction (Z) (S11); respectively obtaining a distance (H1'), along the first direction (Z), from the at least one calibration point to a first detection point (a1) on a mask (200) to be measured, a distance (H2') from the at least one calibration point to a second detection point (a2) on said mask (200) along the first direction (Z), and a distance from the at least one calibration point to a third detection point (a3) on said mask (200) along the first direction (Z) (S12); and calculating a deflection angle of said mask (200) around a second direction (X) with respect to the standard plane (A) and a deflection angle around a third direction (Y) according to obtained data (S13).
Inventors:
ZHANG YIZHI (CN)
YANG XIAOQING (CN)
YANG XIAOQING (CN)
Application Number:
PCT/CN2019/128600
Publication Date:
July 02, 2020
Filing Date:
December 26, 2019
Export Citation:
Assignee:
SHANGHAI MICRO ELECTRONICS EQUIPMENT GROUP CO LTD (CN)
International Classes:
G03F7/20; G01C1/00
Foreign References:
| CN103197510A | 2013-07-10 | |||
| CN103021898A | 2013-04-03 | |||
| CN101216290A | 2008-07-09 | |||
| CN101975560A | 2011-02-16 | |||
| CN104460235A | 2015-03-25 | |||
| CN206282833U | 2017-06-27 | |||
| CN108227402A | 2018-06-29 | |||
| JP2003197502A | 2003-07-11 | |||
| US6020964A | 2000-02-01 |
Attorney, Agent or Firm:
BEYOND ATTORNEYS AT LAW (CN)
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