Title:
MASK MANUFACTURING METHOD, AND MASK
Document Type and Number:
WIPO Patent Application WO/2024/071087
Kind Code:
A1
Abstract:
This mask manufacturing method comprises: a laminate preparation step for preparing a laminate including an inorganic layer containing an inorganic first surface, an inorganic second surface which is a surface on the reverse side of the inorganic first surface, and a plurality of inorganic openings extending from the inorganic first surface to the inorganic second surface, and a resin layer covering the inorganic second surface; and a first dry etching step for forming, in the resin layer, a plurality of first openings corresponding to the plurality of inorganic openings by exposing the inorganic first surface to an etching gas containing a plasmatized processing gas. The first dry etching step includes an isotropic etching step.
Inventors:
KAWASAKI HIROSHI (JP)
OBATA KATSUNARI (JP)
OBATA KATSUNARI (JP)
Application Number:
PCT/JP2023/034855
Publication Date:
April 04, 2024
Filing Date:
September 26, 2023
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD (JP)
International Classes:
C23C14/04; H05B33/10
Foreign References:
| JP2018053348A | 2018-04-05 | |||
| JP2000054164A | 2000-02-22 | |||
| JP2016074938A | 2016-05-12 | |||
| JP2019023348A | 2019-02-14 |
Attorney, Agent or Firm:
MIYAJIMA Manabu et al. (JP)
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