Title:
MASK PROTECTION DEVICE, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE
Document Type and Number:
WIPO Patent Application WO/2013/186929
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a mask protection device which is capable of stably grounding a mask.
A mask protection device of the present invention is characterized by comprising: a first container (41) which is capable of housing a mask; a second container (39) which is capable of housing the first container; conductive movable members (130A, 130B) which are provided to the first container and/or the second container, and which are capable of coming into contact with a conductive film of the mask; and a first conduction member (154) which electrically connects the movable members with the first container and/or the second container.
More Like This:
| JPH0424637 | PHOTOMASK AND PRODUCTION THEREOF |
| JP4858101 | Photomask |
| JPH03139652 | SPRAY PROCESSOR |
Inventors:
OTA KAZUYA (JP)
Application Number:
PCT/JP2012/065412
Publication Date:
December 19, 2013
Filing Date:
June 15, 2012
Export Citation:
Assignee:
NIKON CORP (JP)
OTA KAZUYA (JP)
OTA KAZUYA (JP)
International Classes:
G03F1/68; H01L21/027; G03F7/20
Foreign References:
| JP2006128188A | 2006-05-18 | |||
| JP2000114149A | 2000-04-21 | |||
| JPH04142023A | 1992-05-15 | |||
| JP2002287332A | 2002-10-03 | |||
| JPH09306834A | 1997-11-28 | |||
| JP2006184442A | 2006-07-13 | |||
| US20020066692A1 | 2002-06-06 | |||
| JPH07230162A | 1995-08-29 |
Attorney, Agent or Firm:
OMORI SATOSHI (JP)
Omori 聡 (JP)
Omori 聡 (JP)
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