Title:
MATERIAL FOR FILM FORMATION AND METHOD FOR PRODUCING COATING FILM
Document Type and Number:
WIPO Patent Application WO/2024/053257
Kind Code:
A1
Abstract:
The present invention provides a material for film formation, wherein: a rare earth fluoride (REF3) and a rare earth oxyfluoride (RE-O-F) are seen by X-ray diffractometry; and the ratio (SREF3/SRE-O-F) of the crystallite size (SREF3) of the REF3 to the crystallite size (SRE-O-F) of the RE-O-F is 0.90 to 1.35. It is preferable that the respective crystallite sizes of REF3 and RE-O-F are 40 nm to 100 nm. It is also preferable that the average particle diameter of primary particles as observed with a scanning electronic microscope (SEM) is 0.1 µm to 1.0 µm.
Inventors:
MATSUKURA KENTO (JP)
TANAKA YUTA (JP)
TANAKA YUTA (JP)
Application Number:
PCT/JP2023/026459
Publication Date:
March 14, 2024
Filing Date:
July 19, 2023
Export Citation:
Assignee:
NIPPON YTTRIUM CO LTD (JP)
International Classes:
C23C4/04; C01F17/259; C01F17/265; C23C14/06
Domestic Patent References:
| WO2021124996A1 | 2021-06-24 | |||
| WO2020090977A1 | 2020-05-07 | |||
| WO2022009340A1 | 2022-01-13 |
Foreign References:
| JP2018082154A | 2018-05-24 | |||
| JP2018184657A | 2018-11-22 | |||
| JP2019192701A | 2019-10-31 | |||
| JP2012508684A | 2012-04-12 |
Attorney, Agent or Firm:
SHOWA INTERNATIONAL PATENT FIRM (JP)
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