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Title:
MEASUREMENT DEVICE USING OPTICAL INTERFEROMETRY AND MEASUREMENT METHOD USING OPTICAL INTERFEROMETRY
Document Type and Number:
WIPO Patent Application WO/2015/022851
Kind Code:
A1
Abstract:
Provided are a measurement device using optical interferometry and a measurement method using optical interferometry that accurately measure the depth of a recess having a high aspect ratio. The measurement device is provided with a sensor for measuring distance using optical interferometry, an optical microscope having an optical axis in a fixed relationship with the optical axis of the sensor, a sample stage on which a sample to be measured is placed, a means for maintaining a fixed distance between a sensor head end of the sensor and a surface of the sample during measurement, and a tilt adjustment means for tilting the surface of the sample or the optical axis of the sensor so as to maximize the interference intensity of the sensor light reflected from the surface of the sample or the sensor light reflected from the surface of the sample and the sensor head end.

Inventors:
NAKAMURA MAKOTO (JP)
Application Number:
PCT/JP2014/069690
Publication Date:
February 19, 2015
Filing Date:
July 25, 2014
Export Citation:
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Assignee:
FUJITSU LTD (JP)
International Classes:
G01B11/00; G01B9/02; G01B11/22
Domestic Patent References:
WO2013084565A12013-06-13
WO2010029799A12010-03-18
Foreign References:
JP2007139752A2007-06-07
JP2013117507A2013-06-13
JPH06281432A1994-10-07
JP2011163823A2011-08-25
JPH0394106A1991-04-18
JP2010175672A2010-08-12
JP2008233679A2008-10-02
JPS63229309A1988-09-26
JPH0259603A1990-02-28
JP2012037292A2012-02-23
JPH1089921A1998-04-10
JPH0755418A1995-03-03
JPH06258055A1994-09-16
Attorney, Agent or Firm:
DOI Kenji et al. (JP)
Kenji Doi (JP)
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