MEASUREMENT SYSTEM, MEASUREMENT METHOD, AND PLASMA PROCESSING DEVICE

Title:

MEASUREMENT SYSTEM, MEASUREMENT METHOD, AND PLASMA PROCESSING DEVICE

Document Type and Number:

WIPO Patent Application WO/2021/161804

Kind Code:

A1

Abstract:

Provided is a measurement system comprising: a plasma processing device having a control unit and a plasma generation unit that generates plasma from a gas supplied into a processing container; and an imaging device. The imaging device generates optical information of the plasma from image data of imaged plasma inside the processing container, and the control unit converts the generated optical information of the plasma into a plasma parameter that determines physical characteristics of the plasma with reference to a storage unit that stores correlation information between the optical information of the plasma and measurement results of the plasma parameter.

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Inventors:

SUZUKI AYUTA (JP)
MATSUI HIDEFUMI (JP)
KUBO ATSUSHI (JP)

Application Number:

PCT/JP2021/003205

Publication Date:

August 19, 2021

Filing Date:

January 29, 2021

Export Citation:

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Assignee:

TOKYO ELECTRON LTD (JP)

International Classes:

G01J3/443; H05H1/00; H05H1/46

Foreign References:

JP2002257733A	2002-09-11
JP2010171303A	2010-08-05
JP2017158659A	2017-09-14
JP2005116217A	2005-04-28
JP2013115355A	2013-06-10
JP2005525225A	2005-08-25