Title:
MEDIUM TREATMENT APPARATUS AND LIQUID IMPARTING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2024/024241
Kind Code:
A1
Abstract:
Provided are a medium treatment apparatus and a liquid imparting system that are able to realize both durability performance and suppression of liquid attachment in a member that comes into contact with a medium that has undergone a drying treatment. This medium treatment apparatus (60) comprises: a drying device (34) that applies drying treatment to a medium (S); and a contact member (31) with which a liquid attachment surface of the medium having undergone the drying treatment comes into contact first after the drying treatment. The drying treatment device applies drying treatment so that the liquid attachment surface of the medium will have a liquid mass of 200 μg/cm2 or less per unit area thereof. The contact member has a cooling structure. The adhesion work of a contact surface, which comes into contact with the liquid attachment surface, with respect to a liquid imparting region of the liquid attachment surface is 80 mN/m or less. The contact surface has a Vickers hardness of 450-600 Hv.
Inventors:
NAKAMURA HAYATE (JP)
MITSUYASU TAKASHI (JP)
MITSUYASU TAKASHI (JP)
Application Number:
PCT/JP2023/019309
Publication Date:
February 01, 2024
Filing Date:
May 24, 2023
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
B41J2/01
Foreign References:
| JP2007196513A | 2007-08-09 | |||
| JPH09268483A | 1997-10-14 | |||
| JPH06166174A | 1994-06-14 | |||
| JP2016112727A | 2016-06-23 | |||
| JP2012214650A | 2012-11-08 | |||
| JP2017146540A | 2017-08-24 |
Attorney, Agent or Firm:
MATSUURA, Kenzo (JP)
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