METAL PLATE FOR PRODUCING VAPOR DEPOSITION MASKS, PRODUCTION METHOD FOR METAL PLATES, VAPOR DEPOSITION MASK, PRODUCTION METHOD FOR VAPOR DEPOSITION MASK, AND VAPOR DEPOSITION MASK DEVICE COMPRISING VAPOR DEPOSITION MASK

Title:

Document Type and Number:

WIPO Patent Application WO/2019/098167

Kind Code:

A1

Abstract:

A metal plate used for producing vapor deposition masks and having a thickness of no more than 30 µm. The average cross-sectional area of crystal grains appearing in the cross-section of the metal plate is 0.5–50 µm2, as calculated by using the EBSD method to measure crystal grains and by analyzing the measurement results. The average cross-sectional area is calculated by analyzing the measurement results obtained using the EBSD method, analyzing same using an area method under conditions whereby a section having a difference in crystal orientation of at least 5° is recognized as the crystal grain boundary.

Inventors:

IKENAGA CHIKAO (JP)
HATSUTA CHIAKI (JP)
OKA HIROKI (JP)
MATSUURA SACHIYO (JP)
OKAMOTO HIDEYUKI (JP)
USHIKUSA MASATO (JP)

Application Number:

PCT/JP2018/041918

Publication Date:

May 23, 2019

Filing Date:

November 13, 2018

Export Citation:

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Assignee:

DAINIPPON PRINTING CO LTD (JP)

International Classes:

C23C14/04; H01L51/50; H05B33/10

Domestic Patent References:

WO2015174269A1

2015-11-19

Foreign References:

JP2017088914A	2017-05-25
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Other References: