Title:
(METH)ACRYLATE CONTAINING CYCLIC ETHER GROUP
Document Type and Number:
WIPO Patent Application WO/2013/146651
Kind Code:
A1
Abstract:
The purpose of the invention is to provide a method for industrially manufacturing with high yield a (meth)acrylate containing a cyclic ether group, and to provide an active energy beam curable resin composition obtained by adding said acrylate. A highly pure (meth)acrylate containing a cyclic ether group can be manufactured with a high yield by gas phase thermal decomposition of a norbornene derivative containing a cyclic ether group obtained from a norbornene derivative and an alcohol containing a cyclic ether group, and then purifying by distillation.
Inventors:
TAKENOUCHI MIKI (JP)
YASUNAGA ATSUSHI (JP)
MARUYAMA TAKASHI (JP)
HIRATA MEIRI (JP)
YASUNAGA ATSUSHI (JP)
MARUYAMA TAKASHI (JP)
HIRATA MEIRI (JP)
Application Number:
PCT/JP2013/058522
Publication Date:
October 03, 2013
Filing Date:
March 25, 2013
Export Citation:
Assignee:
KOHJIN HOLDINGS CO LTD (JP)
International Classes:
C07D303/16; C07D305/06
Foreign References:
| JP2010126453A | 2010-06-10 | |||
| JPS4725342B | ||||
| JPH09301966A | 1997-11-25 | |||
| JPH0959269A | 1997-03-04 | |||
| JPH04316566A | 1992-11-06 | |||
| JPH08239372A | 1996-09-17 | |||
| JPH04173783A | 1992-06-22 | |||
| JP2000063371A | 2000-02-29 |
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