Title:
METHOD FOR ACTIVE PHASE CORRECTION USING NEGATIVE INDEX METAMATERIALS, EXPOSURE IMAGING DEVICE AND SYSTEM USING SAME, AND METHOD FOR IMPROVING THE RESOLUTION OF THE EXPOSURE IMAGING DEVICE USING THE NEGATIVE INDEX METAMATERIALS
Document Type and Number:
WIPO Patent Application WO/2011/155683
Kind Code:
A1
Abstract:
The present invention relates to a method for active phase correction using negative index metamaterials, an exposure imaging device and system using same, and a method for improving the resolution of the exposure imaging device using the negative index metamaterials. More particularly, the present invention relates to an exposure imaging system comprising: a light source unit; a light source control unit controlling the wavelength of an electromagnetic wave radiated from the light source; a pattern unit storing information on an exposure object material or circuit arrangement; a lens unit including a negative index metamaterial layer having a negative index, and a positive index metamaterial layer having a positive index which is positioned at both surfaces of the negative index metamaterial layer; and a recording unit recording information on an electromagnetic wave which is transmitted through the lens unit. In addition, the present invention relates to the method for active phase correction comprising the step of controlling the wavelength band radiated from the light source so that the absolute values of the real parts of the dielectric constants of the negative index metamaterial and positive index metamaterial are different, and to the method for improving the resolution of the exposure imaging device in which the negative index metamaterial is formed from a metal-dielectric composite, thereby effectively reducing blurry images without the step of controlling the wavelength band radiated from the light source.
Inventors:
KIM KYOUNG SIK (KR)
PARK HAE SUNG (KR)
LEE KWANG CHIL (KR)
PARK HAE SUNG (KR)
LEE KWANG CHIL (KR)
Application Number:
PCT/KR2011/000477
Publication Date:
December 15, 2011
Filing Date:
January 24, 2011
Export Citation:
Assignee:
UNIV YONSEI IACF (KR)
KIM KYOUNG SIK (KR)
PARK HAE SUNG (KR)
LEE KWANG CHIL (KR)
KIM KYOUNG SIK (KR)
PARK HAE SUNG (KR)
LEE KWANG CHIL (KR)
International Classes:
G03F7/20; H01L21/027
Domestic Patent References:
| WO2007103077A2 | 2007-09-13 |
Foreign References:
| KR20070039169A | 2007-04-11 | |||
| US20070065069A1 | 2007-03-22 | |||
| KR20080073795A | 2008-08-11 |
Attorney, Agent or Firm:
YOON & YANG (Samho Building997-9, Daechi-dong, Gangnam-gu, Seoul 135-502, KR)
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Claims: