Title:
METHOD AND APPARATUS FOR COATING TWO SIDES
Document Type and Number:
WIPO Patent Application WO/1983/001585
Kind Code:
A1
Abstract:
Method and apparatus for continuously and uniformly coating both sides of a substrate (2) which is to be coated with a coating such as a photosensitive material or the like (hereinafter referred to as the "substrate"), while supporting the surface opposite to the surface of the substrate (2) being coated without contact by injecting a gas from a gas injector (3') during the step of coating the surfaces with a coating liquid by coaters (1) and (1'). In this apparatus, the supporting static pressure generated in the gap between the substrate (2) and the injector (3') becomes 1/10 to 1/1,000 of the supplied gas pressure fed to the injector (3'), and the liquid is coated so that the amount by which the substrate (2) floats in the region where the liquid from the coaters is in contact with the substrate (2) is made to be 20 to 500 mum by controlling the supplied pressure, the pressure loss in the injector, and the tension applied to the substrate. In this manner, variations in the floating distance (floating amount) of the substrate (2) can be suppressed to an allowable range, thereby eliminating lateral steps of irregular coating, and obtaining a uniformly thick coating layer.
Inventors:
YOSHINO TETSUYA (JP)
KAGEYAMA TAKASHI (JP)
KATO KAZUO (JP)
KISHIDO TAKESHI (JP)
KAGEYAMA TAKASHI (JP)
KATO KAZUO (JP)
KISHIDO TAKESHI (JP)
Application Number:
PCT/JP1982/000428
Publication Date:
May 11, 1983
Filing Date:
November 04, 1982
Export Citation:
Assignee:
KONISHIROKU PHOTO IND (JP)
International Classes:
B05C5/02; B05C5/00; B05D1/26; B05D1/36; G03C1/74; B05C9/04; B05C9/06; (IPC1-7): B05C5/00; B05D1/30; G03C1/74
Foreign References:
| JPS4917853B1 | 1974-05-04 | |||
| JPS5138737B1 | 1976-10-23 | |||
| JPS53115754A | 1978-10-09 | |||
| JPS5430021A | 1979-03-06 |
Other References:
See also references of EP 0093177A4
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