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Title:
METHOD AND APPARATUS FOR GENERATING PATTERN BASED ON MEASUREMENT PARAMETERS
Document Type and Number:
WIPO Patent Application WO/2023/214811
Kind Code:
A1
Abstract:
According to an embodiment, a pattern generating method may comprise the steps of: receiving measurement parameters; determining locations of points that are bases of pattern generation on the basis of the measurement parameters; and generating a pattern by generating a straight line or a curve connecting the points of which the locations are determined.

Inventors:
AHN HONG HYUN (KR)
PHOEBE GATTA (US)
Application Number:
PCT/KR2023/006082
Publication Date:
November 09, 2023
Filing Date:
May 03, 2023
Export Citation:
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Assignee:
CLO VIRTUAL FASHION INC (KR)
International Classes:
A41H3/00; G06F3/0484; G06T11/20; G06T19/00
Foreign References:
KR101672299B12016-11-03
KR20020095313A2002-12-26
US20070009138A12007-01-11
US20130305547A12013-11-21
KR20200004570A2020-01-14
Attorney, Agent or Firm:
MUHANN PATENT & LAW FIRM (KR)
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