Title:
METHOD AND APPARATUS FOR MEASURING ASYMMETRY OF A MICROSUTRUCTURE, POSITION MEASURING METHOD, POSITION MEASURING APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2014/146906
Kind Code:
A3
Abstract:
A lithographic apparatus includes an alignment sensor including a self-referencing interferometer for reading the position of a mark comprising a periodic structure. An illumination optical system focuses radiation of different colors and polarizations into a spot (406) which scans said structure. Multiple position-dependent signals I
A
(G,R,N,F), I
B
(G,R,N,F) are detected (430A, 430B) in a detection optical system and processed (PU) to obtain multiple candidate position measurements. Each mark comprises sub-structures of a size smaller than a resolution of the optical system. Each mark is formed with a positional offset between the sub-structures and larger structures that is a combination of both known (d1, d2) and unknown (∆d) components. A measured position of at least one mark is calculated using signals from a pair of marks (702-1, 702-2), together with information on differences between the known offsets. in order to correct for said unknown component of said positional offset.
Inventors:
MATHIJSSEN SIMON GIJSBERT JOSEPHUS (NL)
Application Number:
PCT/EP2014/054345
Publication Date:
November 20, 2014
Filing Date:
March 06, 2014
Export Citation:
Assignee:
ASML NETHERLANDS BV (NL)
International Classes:
G03F9/00
Foreign References:
| US6538740B1 | 2003-03-25 | |||
| US20040033426A1 | 2004-02-19 | |||
| US6982793B1 | 2006-01-03 | |||
| EP2071402A2 | 2009-06-17 | |||
| US20020021434A1 | 2002-02-21 | |||
| US20030199131A1 | 2003-10-23 |
Other References:
MEGENS H. ET AL.: "Advances in Process Overlay Alignment Solutions for Future Technology Nodes", SPIE PROCEEDINGS, vol. 6518, 2007, XP002730034, DOI: 10.1117/12.712149
HUIJBREGTSE J ET AL: "Overlay Performance with Advanced ATHENA Alignment Strategies", PROCEEDINGS OF SPIE, S P I E - INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, US, vol. 5038, 1 January 2003 (2003-01-01), pages 918 - 928, XP002511747, ISSN: 0277-786X, ISBN: 978-0-89252-037-4, DOI: 10.1117/12.482814
"Capturing Versatile Scribe-line Primary Marks (VSPM) or the like with a vision capture sensor", RESEARCH DISCLOSURE, MASON PUBLICATIONS, HAMPSHIRE, GB, vol. 505, no. 8, 1 May 2006 (2006-05-01), XP007136148, ISSN: 0374-4353
MOON E E ET AL: "Interferometric-spatial-phase imaging for six-axis mask control", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AVS / AIP, MELVILLE, NEW YORK, NY, US, vol. 21, no. 6, 10 December 2003 (2003-12-10), pages 3112 - 3115, XP002453014, ISSN: 1071-1023, DOI: 10.1116/1.1619960
HUIJBREGTSE J ET AL: "Overlay Performance with Advanced ATHENA Alignment Strategies", PROCEEDINGS OF SPIE, S P I E - INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, US, vol. 5038, 1 January 2003 (2003-01-01), pages 918 - 928, XP002511747, ISSN: 0277-786X, ISBN: 978-0-89252-037-4, DOI: 10.1117/12.482814
"Capturing Versatile Scribe-line Primary Marks (VSPM) or the like with a vision capture sensor", RESEARCH DISCLOSURE, MASON PUBLICATIONS, HAMPSHIRE, GB, vol. 505, no. 8, 1 May 2006 (2006-05-01), XP007136148, ISSN: 0374-4353
MOON E E ET AL: "Interferometric-spatial-phase imaging for six-axis mask control", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AVS / AIP, MELVILLE, NEW YORK, NY, US, vol. 21, no. 6, 10 December 2003 (2003-12-10), pages 3112 - 3115, XP002453014, ISSN: 1071-1023, DOI: 10.1116/1.1619960
Attorney, Agent or Firm:
VAN DE VEN, Jan-Piet (AH Veldhoven, NL)
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