Title:
METHOD AND APPARATUS FOR PROCESSING OF RADIATION-SENSITIVE PATTERNING COMPOSITIONS
Document Type and Number:
WIPO Patent Application WO2004063811
Kind Code:
A3
Abstract:
A method and system for processing patterning compositions such as those applied to printing plates are disclosed. An Infrared (IR) oven, instead of a conventional convection oven, is used for preheating image-wise exposed patterning composition before the exposed image is developed. In one embodiment of the invention, a substrate is coated with a layer of a patterning composition. The layer is then image-wise exposed. The coated substrate is then passed under one or more IR emitter tubes to preheat the image-wise exposed patterning composition, which is subsequently developed. The use of an IR oven offers the advantages of more precise and rapid temperature control, smaller system footprint, lower energy consumption and higher throughput as compared to the conventional methods and systems.
Inventors:
COLLINS JEFFREY J
JORDAN THOMAS R
TAO TING
POLAND EUGENE
JORDAN THOMAS R
TAO TING
POLAND EUGENE
Application Number:
PCT/US2004/000571
Publication Date:
March 24, 2005
Filing Date:
January 08, 2004
Export Citation:
Assignee:
KODAK POLYCHROME GRAPHICS LLC (US)
International Classes:
G03F7/38; (IPC1-7): G03F7/38
Foreign References:
| US20020116815A1 | 2002-08-29 | |||
| US5932391A | 1999-08-03 | |||
| US6100012A | 2000-08-08 |
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