Title:
METHOD AND APPARATUS FOR PRODUCING UNIFORM PROCESS RATES
Document Type and Number:
WIPO Patent Application WO2003012821
Kind Code:
A3
Abstract:
An antenna arrangement for generating an electric field inside a process chamber is provided. Generally, the antenna arrangement comprises a first loop disposed around an antenna axis. The first loop comprises a first turn (704) with a first turn gap (1112); a second turn (708) with a second turn gap, where the second turn is concentric and coplanar with the first turn and spaced apart from the first turn, and where the antenna axis passes through the center of the first turn and second turn; and a first turn-second turn connector (1132) electrically connected between a second end of the first turn and a first end of the second turn comprising a spanning section between and coplanar with the first turn and the second turn and which spans the first turn gap and the second turn gap.
Inventors:
WILCOXSON MARK H (US)
BAILEY III ANDREW D (US)
KUTHI ANDRAS (US)
SMITH MICHAEL G R (US)
SCHOEPP ALAN M (US)
BAILEY III ANDREW D (US)
KUTHI ANDRAS (US)
SMITH MICHAEL G R (US)
SCHOEPP ALAN M (US)
Application Number:
PCT/US2002/023092
Publication Date:
December 24, 2003
Filing Date:
July 18, 2002
Export Citation:
Assignee:
LAM RES CORP (US)
WILCOXSON MARK H (US)
BAILEY III ANDREW D (US)
KUTHI ANDRAS (US)
SMITH MICHAEL G R (US)
SCHOEPP ALAN M (US)
WILCOXSON MARK H (US)
BAILEY III ANDREW D (US)
KUTHI ANDRAS (US)
SMITH MICHAEL G R (US)
SCHOEPP ALAN M (US)
International Classes:
H01J37/32; H05H1/46; H01L21/3065; (IPC1-7): H01J37/32
Domestic Patent References:
| WO2001045134A2 | 2001-06-21 |
Foreign References:
| EP0813227A2 | 1997-12-17 | |||
| US6028395A | 2000-02-22 |
Other References:
PATENT ABSTRACTS OF JAPAN vol. 1997, no. 07 31 July 1997 (1997-07-31)
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