Title:
METHOD AND APPARATUS FOR RESIDUE DETECTION IN THE EDGE DELETED AREA OF A SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2010/121112
Kind Code:
A3
Abstract:
Apparatus and methods for detecting residue on a glass substrate and method of use are disclosed. The apparatus comprises a substrate support, a sensor, a controller and a peripheral device in communication with the controller. The apparatus measures the height or thickness of a main surface and an edge delete surface of a substrate to determine if film residue is present on the edge delete surface.
Inventors:
TSAI KENNETH CHIEN-QUEN (US)
SCHLEZINGER ASAF (US)
SCHLEZINGER ASAF (US)
Application Number:
PCT/US2010/031364
Publication Date:
January 13, 2011
Filing Date:
April 16, 2010
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
TSAI KENNETH CHIEN-QUEN (US)
SCHLEZINGER ASAF (US)
TSAI KENNETH CHIEN-QUEN (US)
SCHLEZINGER ASAF (US)
International Classes:
G01N21/88; G01B11/06; G01B11/30; G01N21/47; H01L21/67
Foreign References:
| KR20060077021A | 2006-07-05 | |||
| JPH0562952A | 1993-03-12 | |||
| US7070479B2 | 2006-07-04 | |||
| JP2007299910A | 2007-11-15 | |||
| US5461007A | 1995-10-24 |
Attorney, Agent or Firm:
SERVILLA, Scott S. (33 Wood Ave SouthSecond Floor, Suite 21, Iselin NJ, US)
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