Title:
METHOD AND APPARATUS FOR ROUTING HARMONICS IN A PLASMA TO GROUND WITHIN A PLASMA ENCHANCED SEMICONDUCTOR WAFER PROCESSING CHAMBER
Document Type and Number:
WIPO Patent Application WO2003090247
Kind Code:
A3
Abstract:
A method and apparatus for routing harmonic energy within a plasma to ground in a plasma enhanced semiconductor wafer processing reactor. A model of the chamber is used to determine the pathway for RF power and the harmonic energy of that RF power through the chamber. From this model, the placement and design of a harmonic routing circuit is determined to shunt the harmonic energy to ground.
Inventors:
SHANNON STEVEN C
HOFFMAN DANIEL J
BARNES MICHAEL
LABLANC LEE
HOFFMAN DANIEL J
BARNES MICHAEL
LABLANC LEE
Application Number:
PCT/US2003/011781
Publication Date:
February 17, 2005
Filing Date:
April 15, 2003
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
International Classes:
H01J37/32; (IPC1-7): H01J37/32
Domestic Patent References:
| WO2001071765A2 | 2001-09-27 |
Foreign References:
| US5187457A | 1993-02-16 | |||
| EP1193746A1 | 2002-04-03 | |||
| US6537421B2 | 2003-03-25 |
Other References:
See also references of EP 1522086A2
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