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Title:
METHOD AND APPARATUS FOR TREATMENT OF GAS BY HYDROTHERMAL ELECTROLYSIS
Document Type and Number:
WIPO Patent Application WO/2000/047308
Kind Code:
A1
Abstract:
A method for treating a gas containing a reducing substance, characterized as comprising introducing a gas containing a reducing substance to a reactor filled with an aqueous medium containing a halide ion at a temperature which is 100 °C or higher and not higher than the critical temperature of the aqueous medium and under a pressure whereunder the aqueous medium keeps a liquid state, while passing a direct current through the reactor. The method can be used for providing a method and an apparatus for treating a gas containing a reducing substance to thereby decompose and/or remove the reducing substance.

Inventors:
SU QINGQUAN (JP)
SERIKAWA ROBERTO MASAHIRO (JP)
ISAKA MASAHIRO (JP)
NISHIMURA TATSUYA (JP)
KUBOTA YOKO (JP)
Application Number:
PCT/JP2000/000745
Publication Date:
August 17, 2000
Filing Date:
February 10, 2000
Export Citation:
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Assignee:
EBARA CORP (JP)
SU QINGQUAN (JP)
SERIKAWA ROBERTO MASAHIRO (JP)
ISAKA MASAHIRO (JP)
NISHIMURA TATSUYA (JP)
KUBOTA YOKO (JP)
International Classes:
B01D53/32; B01D53/77; B01J3/04; B01J10/00; B01J19/00; B01J19/18; B01J19/26; C02F1/461; C02F1/467; C02F1/02; C02F1/74; (IPC1-7): B01D53/77; C02F1/461
Domestic Patent References:
WO1999007641A11999-02-18
Foreign References:
JPH05220344A1993-08-31
JPS5232442A1977-03-11
JPS6290730U1987-06-10
Other References:
See also references of EP 1166852A4
Attorney, Agent or Firm:
Shamoto, Ichio (New Ohtemachi Bldg. 2-1 Ohtemachi 2-chome Chiyoda-ku, Tokyo, JP)
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