Title:
METHOD AND APPARATUS FOR TREATMENT OF GAS BY HYDROTHERMAL ELECTROLYSIS
Document Type and Number:
WIPO Patent Application WO/2000/047308
Kind Code:
A1
Abstract:
A method for treating a gas containing a reducing substance, characterized as comprising introducing a gas containing a reducing substance to a reactor filled with an aqueous medium containing a halide ion at a temperature which is 100 °C or higher and not higher than the critical temperature of the aqueous medium and under a pressure whereunder the aqueous medium keeps a liquid state, while passing a direct current through the reactor. The method can be used for providing a method and an apparatus for treating a gas containing a reducing substance to thereby decompose and/or remove the reducing substance.
Inventors:
SU QINGQUAN (JP)
SERIKAWA ROBERTO MASAHIRO (JP)
ISAKA MASAHIRO (JP)
NISHIMURA TATSUYA (JP)
KUBOTA YOKO (JP)
SERIKAWA ROBERTO MASAHIRO (JP)
ISAKA MASAHIRO (JP)
NISHIMURA TATSUYA (JP)
KUBOTA YOKO (JP)
Application Number:
PCT/JP2000/000745
Publication Date:
August 17, 2000
Filing Date:
February 10, 2000
Export Citation:
Assignee:
EBARA CORP (JP)
SU QINGQUAN (JP)
SERIKAWA ROBERTO MASAHIRO (JP)
ISAKA MASAHIRO (JP)
NISHIMURA TATSUYA (JP)
KUBOTA YOKO (JP)
SU QINGQUAN (JP)
SERIKAWA ROBERTO MASAHIRO (JP)
ISAKA MASAHIRO (JP)
NISHIMURA TATSUYA (JP)
KUBOTA YOKO (JP)
International Classes:
B01D53/32; B01D53/77; B01J3/04; B01J10/00; B01J19/00; B01J19/18; B01J19/26; C02F1/461; C02F1/467; C02F1/02; C02F1/74; (IPC1-7): B01D53/77; C02F1/461
Domestic Patent References:
WO1999007641A1 | 1999-02-18 |
Foreign References:
JPH05220344A | 1993-08-31 | |||
JPS5232442A | 1977-03-11 | |||
JPS6290730U | 1987-06-10 |
Other References:
See also references of EP 1166852A4
Attorney, Agent or Firm:
Shamoto, Ichio (New Ohtemachi Bldg. 2-1 Ohtemachi 2-chome Chiyoda-ku, Tokyo, JP)
Download PDF:
Previous Patent: SEPARATION DEVICES AND PROCESSES
Next Patent: METHOD OF REMOVING METHANOL FROM OFF GASES
Next Patent: METHOD OF REMOVING METHANOL FROM OFF GASES