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Patent Searching and Data


Title:
METHOD OF APPLYING MASKING MATERIAL
Document Type and Number:
WIPO Patent Application WO2002049051
Kind Code:
A3
Abstract:
A method of preparing a capacitor having at least one porous element comprising applying to the element a masking material with an ink jet printer head. Preferably the masking material is a liquid resin such as an acrylic, a polyurethane, a silicone, or a polyimide.

Inventors:
LESSNER PHILIP MICHAEL
FERNSTROM PETER
MELODY BRIAN JOHN
KINARD JOHN TONY
Application Number:
PCT/US2001/047652
Publication Date:
April 03, 2003
Filing Date:
December 14, 2001
Export Citation:
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Assignee:
KEMET ELECTRONICS CORP (US)
International Classes:
H01G9/00; H01G9/15; (IPC1-7): H01G9/15; H01G9/00
Domestic Patent References:
WO1999019900A21999-04-22
Foreign References:
GB2330451A1999-04-21
GB2350321A2000-11-29
EP1030324A12000-08-23
US5560543A1996-10-01
Other References:
PATENT ABSTRACTS OF JAPAN vol. 1997, no. 07 31 July 1997 (1997-07-31)
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