Title:
METHOD FOR CLEANING HIGH-PRESSURE GAS CONTAINER, AND HIGH-PRESSURE GAS CONTAINER
Document Type and Number:
WIPO Patent Application WO/2016/088829
Kind Code:
A1
Abstract:
[Problem] To provide a cleaning method suitable for removing moisture in a high-pressure gas container. [Solution] A pressure-raising step for introducing a hydrophilic gas into the high-pressure gas container and raising the pressure, and a discharge step for discharging the gas in the high-pressure gas container are repeatedly performed in the method for cleaning a high-pressure gas container according to the present invention.
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Inventors:
KUWANA AKIHIRO (JP)
YAMAUCHI HIROKI (JP)
HONDA HIROKI (JP)
YAMAUCHI HIROKI (JP)
HONDA HIROKI (JP)
Application Number:
PCT/JP2015/083997
Publication Date:
June 09, 2016
Filing Date:
December 03, 2015
Export Citation:
Assignee:
SUMITOMO SEIKA CHEMICALS (JP)
International Classes:
F17C13/00
Foreign References:
| JP2011208712A | 2011-10-20 | |||
| JPH05280699A | 1993-10-26 | |||
| JPH05280695A | 1993-10-26 | |||
| JP2002054799A | 2002-02-20 |
Attorney, Agent or Firm:
YOSHIDA Minoru et al. (JP)
Yoshida 稔 (JP)
Yoshida 稔 (JP)
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