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Title:
METHOD FOR CONCENTRATING PROCESSING WASTE LIQUID AND METHOD FOR RECYCLING PROCESSING WASTE LIQUID
Document Type and Number:
WIPO Patent Application WO/2014/002835
Kind Code:
A1
Abstract:
This method for concentrating processing waste liquid includes a step in which waste liquid produced by developing lithographic printing plates with a developer is obtained after exposure. The lithographic printing plate has, on a substrate, an image recording layer containing an infrared-absorbing dye, a polymerization initiator and a polymerizable compound on a substrate, and a protective layer. The developer: contains 1 mass% to 10 mass% of an anionic surfactant having a naphthalene skeleton and/or a nonionic surfactant having a naphthalene skeleton; contains 2 mass% or less of an organic solvent with a boiling point of 100°C to 300°C; and a pH of 6.0 to 9.5. This method for concentrating processing waste liquid further includes a step in which the waste liquid is concentrated through evaporation in such a manner that the ratio of the quantity of the processing waste liquid after concentration to the quantity of processing waste liquid before concentration is 1/2 to 1/10 on a volume basis.

Inventors:
WARIISHI KOJI (JP)
KOBAYASHI FUMIKAZU (JP)
MORI TAKANORI (JP)
Application Number:
PCT/JP2013/066758
Publication Date:
January 03, 2014
Filing Date:
June 18, 2013
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/32; C02F1/04; G03F7/00; G03F7/004; G03F7/11
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See also references of EP 2869122A4
Attorney, Agent or Firm:
NAKAJIMA, Jun et al. (JP)
Nakajima 淳 (JP)
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