Title:
METHOD FOR CONTROLLING RADIO FREQUENCY SOURCE
Document Type and Number:
WIPO Patent Application WO/2020/078393
Kind Code:
A1
Abstract:
A method for controlling a radio frequency source, the radio frequency source comprising at least one pair of a main power supply (1) and a slave power supply (5) having the same frequency. The method for controlling the radio frequency source comprises: dividing each process step in a plasma process into a plurality of time periods, and when the process step is performed, maintaining the commonly excited phase-locked angle, corresponding to each time period, of said at least one pair of the main power supply (1) and the slave power supply (5) at a predetermined value, so as to improve the angular distribution uniformity of a plasma. The method for controlling the radio frequency source is able to adjust the distribution of the plasma above a workpiece to be processed, and generally average the angular distribution of the plasma in the entire process step, thereby improving the process uniformity of the workpiece to be processed.
Inventors:
HUANG YAHUI (CN)
WEI GANG (CN)
WEI JING (CN)
LI JUANJUAN (CN)
CHEN GUODONG (CN)
YANG JING (CN)
WEI GANG (CN)
WEI JING (CN)
LI JUANJUAN (CN)
CHEN GUODONG (CN)
YANG JING (CN)
Application Number:
PCT/CN2019/111500
Publication Date:
April 23, 2020
Filing Date:
October 16, 2019
Export Citation:
Assignee:
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD (CN)
International Classes:
H01J37/32
Foreign References:
CN109273341A | 2019-01-25 | |||
CN103515178A | 2014-01-15 | |||
CN103715049A | 2014-04-09 | |||
US20080053818A1 | 2008-03-06 | |||
CN108269726A | 2018-07-10 | |||
CN106920729A | 2017-07-04 |
Attorney, Agent or Firm:
TEE & HOWE INTELLECTUAL PROPERTY ATTORNEYS (CN)
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