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Patent Searching and Data


Title:
METHOD FOR CONTROLLING RADIO FREQUENCY SOURCE
Document Type and Number:
WIPO Patent Application WO/2020/078393
Kind Code:
A1
Abstract:
A method for controlling a radio frequency source, the radio frequency source comprising at least one pair of a main power supply (1) and a slave power supply (5) having the same frequency. The method for controlling the radio frequency source comprises: dividing each process step in a plasma process into a plurality of time periods, and when the process step is performed, maintaining the commonly excited phase-locked angle, corresponding to each time period, of said at least one pair of the main power supply (1) and the slave power supply (5) at a predetermined value, so as to improve the angular distribution uniformity of a plasma. The method for controlling the radio frequency source is able to adjust the distribution of the plasma above a workpiece to be processed, and generally average the angular distribution of the plasma in the entire process step, thereby improving the process uniformity of the workpiece to be processed.

Inventors:
HUANG YAHUI (CN)
WEI GANG (CN)
WEI JING (CN)
LI JUANJUAN (CN)
CHEN GUODONG (CN)
YANG JING (CN)
Application Number:
PCT/CN2019/111500
Publication Date:
April 23, 2020
Filing Date:
October 16, 2019
Export Citation:
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Assignee:
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD (CN)
International Classes:
H01J37/32
Foreign References:
CN109273341A2019-01-25
CN103515178A2014-01-15
CN103715049A2014-04-09
US20080053818A12008-03-06
CN108269726A2018-07-10
CN106920729A2017-07-04
Attorney, Agent or Firm:
TEE & HOWE INTELLECTUAL PROPERTY ATTORNEYS (CN)
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