Title:
METHOD FOR THE DEPOSITION IN PARTICULAR OF METAL OXIDES BY NON-CONTINUOUS PRECURSOR INJECTION
Document Type and Number:
WIPO Patent Application WO2005093127
Kind Code:
A3
Abstract:
The invention relates to a method for the deposition of at least one layer on at least one substrate in a process chamber, whereby the layer comprises at least one component. The at least one first metal component is vaporised in a particularly conditioned carrier gas by means of a non-continuous injection of a starting material in the form of a liquid or dissolved in a liquid and at least one second component as chemically-reactive starting material. The starting materials are alternately introduced into the process chamber and the second starting material is a chemically-reactive gas or a chemically-reactive liquid.
Inventors:
BAUMANN PETER (DE)
SCHUMACHER MARCUS (DE)
LINDNER JOHANNES (DE)
SCHUMACHER MARCUS (DE)
LINDNER JOHANNES (DE)
Application Number:
PCT/EP2005/051050
Publication Date:
April 13, 2006
Filing Date:
March 09, 2005
Export Citation:
Assignee:
AIXTRON AG (DE)
BAUMANN PETER (DE)
SCHUMACHER MARCUS (DE)
LINDNER JOHANNES (DE)
BAUMANN PETER (DE)
SCHUMACHER MARCUS (DE)
LINDNER JOHANNES (DE)
International Classes:
C23C16/44; C23C16/448; C23C16/455; (IPC1-7): C23C16/455; C23C16/448
Domestic Patent References:
| WO2002027063A2 | 2002-04-04 |
Foreign References:
| US20030224578A1 | 2003-12-04 |
Other References:
See also references of EP 1733073A2
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