Title:
METHOD OF DETECTING QUALITY OF POLYSILICON THIN FILM AND SYSTEM UTILIZING SAME
Document Type and Number:
WIPO Patent Application WO/2017/008320
Kind Code:
A1
Abstract:
The present invention provides a method of detecting quality of a polysilicon thin film and a system utilizing the same. The method of detecting the quality comprises: illuminating light on a polysilicon thin-film panel, and taking a picture of a polysilicon thin film to obtain a thin film picture; dividing the thin film picture into a plurality of picture units; obtaining, according to a comparison result of comparing a display parameter of the polysilicon thin film shown on the picture units and a predefined parameter, a number of qualified picture units; and determining, according to the number of the qualified picture units and a total number of the picture units, quality of the polysilicon thin film.
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Inventors:
YEH YUCHUN (CN)
TANG LIJUAN (CN)
LI YONG (CN)
WANG ZHIGANG (CN)
LI ZIJIAN (CN)
TANG LIJUAN (CN)
LI YONG (CN)
WANG ZHIGANG (CN)
LI ZIJIAN (CN)
Application Number:
PCT/CN2015/084468
Publication Date:
January 19, 2017
Filing Date:
July 20, 2015
Export Citation:
Assignee:
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
G01N21/17
Foreign References:
CN103556561A | 2014-02-05 | |||
CN103942791A | 2014-07-23 | |||
CN101093246A | 2007-12-26 | |||
CN104359925A | 2015-02-18 | |||
US20110142291A1 | 2011-06-16 |
Attorney, Agent or Firm:
ESSEN PATENT & TRADEMARK AGENCY (CN)
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