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Title:
METHOD AND DEVICE FOR FORMING GRAPHENE STRUCTURE
Document Type and Number:
WIPO Patent Application WO/2020/189202
Kind Code:
A1
Abstract:
This method for forming a graphene structure includes preparing a substrate, supplying a first treatment gas including a carbon-containing gas to the substrate while heating the substrate, without the use of a plasma, and performing a pre-treatment, and forming a graphene structure on the surface of the substrate by plasma CVD using a plasma of a second treatment gas including a carbon-containing gas.

Inventors:
IFUKU RYOTA (JP)
MATSUMOTO TAKASHI (JP)
SUGIURA MASAHITO (JP)
Application Number:
PCT/JP2020/007748
Publication Date:
September 24, 2020
Filing Date:
February 26, 2020
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Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
C23C16/26; C01B32/186; C23C16/02; H01L21/205; H05H1/46
Foreign References:
JP2017521339A2017-08-03
JP2016520032A2016-07-11
JP2013100205A2013-05-23
JP2014231455A2014-12-11
Attorney, Agent or Firm:
TAKAYAMA Hiroshi (JP)
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