Title:
METHOD AND DEVICE FOR MANUFACTURING A SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2011/102135
Kind Code:
A1
Abstract:
In the provided method, a mask layer is formed via the following steps: a step in which a first photoresist layer is formed, exposed, and developed on a substrate, thereby forming a first photoresist pattern; a step in which the first photoresist pattern is made insoluble; a step in which a second photoresist layer is formed, exposed, and developed on top of the first photoresist pattern, thereby forming a second photoresist pattern that intersects the first photoresist pattern; a step in which the second photoresist pattern is made insoluble; and a step in which a third photoresist layer is formed, exposed, and developed on top of the first and second photoresist patterns, thereby forming a third photoresist pattern.
Inventors:
OYAMA KENICHI (JP)
Application Number:
PCT/JP2011/000887
Publication Date:
August 25, 2011
Filing Date:
February 17, 2011
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
OYAMA KENICHI (JP)
OYAMA KENICHI (JP)
International Classes:
H01L21/027; G03F7/20; G03F7/40; H01L21/28; H01L21/768
Foreign References:
| JP2004348141A | 2004-12-09 | |||
| JP2009300978A | 2009-12-24 | |||
| JPH0471222A | 1992-03-05 |
Attorney, Agent or Firm:
SAKURA PATENT OFFICE, p. c. (JP)
Patent business corporation cherry tree international patent firm (JP)
Patent business corporation cherry tree international patent firm (JP)
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